A novel optical configuration was proposed to realize the fast etching of optical variable device on laser lithographic system.The grating interference head is used to generate the interferential fringes and the spatial light modulator(SLM) is used as the sub-image input device.The resolution of optical variable device can be achieved up to 5 080 dpi.This system can be run in very high efficient mode with 8 000 dots/s.The large format laser lithographic system has been fabricated and the result is given.