In this study,polycrystalline TiN/AlN multilayer film with various modulation ratios was deposited onto silicon substrate using pulsed laser ablation.The microstructure and the nanoindentation hardness of TiN/AlN multilayer films were also investigated.SEM and AFM confirmed a standard modulation ratio ranging from 1 to 4,the least density and large tracts of island had been found in small modulaton ratio.XRD revealed that an obvious preferred orientation(002) is appeared in AlN phase,and orientation(200)(22...