TiNx films are deposited by reactive magnetron sputtering on Si substrate(100) at different substrate temperature.The crystallization,microstructure and composition of the films are characterized by X-ray diffraction(XRD),scanning electronic microscope(SEM) and energy dispersive spectrometer(EDS).The resistivity of TiNx films is measured by a four-probe instrument.The relation of the substrate temperature with the structure and resistivity of TiNx films is investigated.The results show that the diffraction ...