V2O5/V/V2O5 multi-layer films have been fabricated on Si3N4 substrate via intermittent-oxygen-supply method by radio frequency magnetron sputtering.The impact of annealing condition on the square resistance and temperature coefficient of resistance(TCR) have been studied.The results indicate that after annealing process the square resistance of V2O5/V/V2O5 multi-layer films decreases largely,and the relation between resistance and temperature shows a good linear property,and these films fulfill high TCR and...