The TiN/AlN thin films are deposited on silicon substrate by pulsed laser ablation.By using the constructed neural network model,a multilayer struture with modulation period ranged from 10 to 200 nm is designed accurately.Both composition and structure of the films are analyzed by microhardness tester,SEM XPS and XRD.TiN film exhibits nanocrystalline columns,whereas AlN shows amphous state.The TiN/AlN multilayer presents microstructural features typical for both materials.The film hardness of 16.9 GPa for A...