Natively textured hydrogenated gallium-doped zinc oxide(HGZO) thin films were deposited via direct current(DC) magnetron sputtering on glass substrates at the substrate temperature of 280 ℃.These natively textured HGZO thin films exhibit high optical transmittance(over 80%) in the visible and near infrared region(λ～380-1 100 nm) and excellent electrical properties.The as-grown optimized HGZO thin films with pyramid-like textured surface obtained at the hydrogen flow rate of ～2.0 sccm exhibit a relative low sheet resistance of ～4.8 Ω and resistivity of 8.77×10-4 Ω·cm.The influence of hydrogen flow rate on the surface morphology,electrical and optical properties for HGZO thin films is investigated in detail.We put forward a method of gradient H2 for growing HGZO thin films so as to obtain good create-like feature size and high optical transmittance as well as high electrical conductivity.