Two anti-reflective films at 1 064 nm with different electric field intensity distributions,namely,G/H3L/A and G/M2HL/A,were designed and prepared on K9 glass substrates by ion beam assistant deposition(IBAD) technique.The damage morphology and laser-induced damage threshold(LIDT) of these films were investigated in this paper.The results indicate that the different electric field intensity distributions of the films may generate different laser damage properties.When the electric field intensity(normalized electric field intensity squared) is 1.039 and 0.906 respectively at the interface between layer and air,the damaged area of sample G/H3L/A is always larger than that of sample G/M2HL/A,as the laser incident energy is 180 mJ,150 mJ,or 120 mJ at one pulse.The LIDTs of the samples are 12.3 J/cm2 and 14.8 J/cm2(1 064 nm,12 ns) respectively.It shows that a higher LIDT may be obtained under lower electric field intensity at layer-air interface.Therefore,the damage properties of the films may be improved by lowering the electric field intensity at the layer-air interface during the process of film stack optimization design.