The curing shrinkage is one of the most important problems in UV-embossing,which can bring much fabrication error.Thiol-ene polymer has a delayed gel point,so the shrinkage stress caused by curing can be relaxed easily,and the shrinkage error can be brought down.In this paper,we propose a method which fabricates micro optical elements with continuous relief through UV-embossing process based on thiol-ene resist in order to reduce the influence of curing shrinkage.It can be seen from the experiment results that the curing shrinkage of this material is about 13%,but the fabrication error can be reduced to less than 2%.And the reactive ion etching experiment results show that the continuous relief can be transferred into fused silica substrates with the equal etching ratio through the reactive ion etching by adjusting the parameters of the etching gas.So it is a proper method to fabricate micro optical elements with continuous relief through UV-embossing with thiol-ene resist.