In order to achieve high-luminance and tiny-size organic light-emitting diode(OLED),contact photolithography and vacuum thermal evaporation are adopted to fabricate OLEDs with different ITO masks:glass/ITO/LiF/hole transport layer(HTL,NPD)/light-emitting layer(EML,0.5-0.6 vol%Rubrene:Alq3)/electron transport layer(ETL,Alq3)/cathode,in which LiF is used as the insulating layer.We obtain a microfine device with a light-emitting area of 45 μm×2 mm and a tiny device with a diameter of 44 μm,which exhibit the maximum current density of 7 A/cm2 and 40 A/cm2,respectively.