Ag films with the normal thickness (d) ranging from 25n m to 200nm we re deposited on anodic aluminum oxide (AAO) templates (200nm pore diameter) and quartz substrates by thermal evaporation technique.The effects of thickness on the structure,optical and electrical properties are investigated.The mic r ostructure is studied by X-ray diffraction (XRD) and scanning electron microsco py (SEM).Op tical and electrical properties are measured by spectrophotometer and Van der P auw method,respectively.The results show that the crystalline performance of t he Ag films on quartz substrates (QuartzAg) is better than that of the Ag films on AAO templates (AAOAg).When d=200nm,the nanoparticles in AAOAg film pile up.Total reflectance (R) of both AAOAg and QuartzAg film s increases with the inc rease of d.But R of AAOAg film i s much lower than that of QuartzAg film.As d i s 109nm,R of QuartzAg film is higher than 95% in the vi sible and near infrared optical regions,while R of AAOAg film is only 40%.The Q uartzAg film with 25nm thi ckness is conductive,but d of the conductive AAOAg film must be larger than 37nm.At the same d,the sheet resistance of AAOAg film is h igher than that of QuartzAg film.The difference of sheet resistance between AAO Ag and QuartzAg films de creases from 4.90Ω/□ to 0.37Ω/□ as d increases fro m 37nm to 200nm.