The CNx films were deposited on monocrystal silicon su bstrates by pulsed laser ablation of CNx target under the nitrogen gas pressure ranging from 2Pa to 11Pa.The chemical composit ion,bonding properties and surface morphology of the CNx films are investigated by X-ray photoelectron spectroscopy (XPS),Raman spectroscopy and scanning electron microscopy (SEM),respectively.Meanwh ile,the tribological properties of the films are tested by using a ball-on-disk tribometer.The re sults show that low deposition pressure could degrade the nitrogen content and wear resistance of the pulse laser deposited CNx films.In the range of deposition pressure from 5Pa to 8Pa,it is good for the formatio n of the sp^3hybrid bonding but the nitrogen content decreases gradually.A decreased ratio of x_sp ²/x_sp³and ID/IG,an inc reased ratio of x_sp²C-N/x_sp³C-N and a good wear resistance at the order of (2.7－4.3)×10－15·m³·N －1·m－1 but a higher friction coefficient about 0.24－0.25are observed under the deposition pressure ranging from 5Pa to 8Pa. Further increase in deposition pressure leads to the decrease of N content and an increased degree of graphitiz at ion,the friction coefficient of the film is around 0.19,and a worse wear re sistance is found.