氧化钒薄膜的制备及其在光激励下对太赫兹波的调制
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梁继然(1978-),男,博士,讲师,主要从事氧化钒 敏感材料的制备、相变机理研究与相关器件制作.

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国家自然科学基金青年科学基金(61101055)和高等学校博士学科点专项 科研基金(20100032120029)资助项目 (天津大学 电子信息工程学院,天津 300072)


Preparation of VOx thin film and its modulation for t erahertz wave under laser excitation
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    摘要:

    采用磁控溅射法在蓝宝石基底上制备金属钒薄膜 ,然后在O2中快速热处理获得具 有相变特性的VOx薄膜。实验对比了不同的热处理温度和热 处理时间对薄膜性能的影响,薄膜的结晶状 况用X射线衍射(XRD)进行分析;利用THz时域频谱系统,观测薄膜在不同激励光功 率下的相变特性及其对THz波的调制作用。结果表明,在570 ℃ 条件下快速热处理60s所制得的VOx薄 膜性能最佳,薄膜对THz波透过性最好,光激励后对THz波的 调制作用最大,调制幅度达到83.9%,且引发 相变的功率阈值低。

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    Vanadium thin film was grown on sapphire substrate by magnetron sputter ing.And then the film was annealed in oxygen by the rapid thermal processing to get VOx thin film whic h has the property of semiconductor to metal transition.The experiment is conducted under diff erent annealing t emperatures and different annealing time which can affect the characteristics of VOx thin film.The X-ray diffraction (XRD) is em ployed to analyze the crystalline structure of the thin film.The terahertz (THz) transmission modulation of VOx thin f ilm under laser excitation with different power is studied by THz time-domain spectroscopy (TDS).The results sh ow that the VOx thin film prepared in the experiment has the property of transition between insulator phase and metal phase.The best annealing condition of this VOx thin film is 570℃ with 60s treatment.The terahertz transmission modulation of VOx thin film under la ser excitation is high.The amplitude of modulation is 83.9%.The starting power a nd the power range of transition are low.The VOx thin film can be applied in the study of light switch and modulator.

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夏晓旭,胡明,朱乃伟,梁继然,韦晓莹.氧化钒薄膜的制备及其在光激励下对太赫兹波的调制[J].光电子激光,2014,(4):681~686

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  • 收稿日期:2013-09-12
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