Large area nano-structured silicon has been fabricated by using metal assi sted catalyst wet chemical etching method.Based on the mechanism of metal assisted catalyst wet chemical etching, the architecture of the nano-structured Si is changed from nanowire array s to nanohole arrays by adjusting the morphology of the metal Ag catalytic layer.The Si nanohole with textured Si surfaces show excellent broadband antireflection compared with that of the planar or pyramid textured surface.The light reflectance loss rate of the crystalline Si with nano hole textured Si surfaces is low than 3.6% for AM 1.5G photons in the 300－1100nm range.T he Si nanoholes can be antireflection structure for crystalline Si solar c ell application,due to its simple and fast fabrication process,excellent broadband antireflection and mechanical stabilit y.