This paper presents the effect of annealing temperature on the optical pro perties and photocatalytic ability of electron beam evaporated Ag/TiO_2thin films.The films were deposited employ ing electron beam evaporation technique on fused silica and Si substrates followed by thermal annealing in air atmosphere at temperature 400℃,500℃ and 600℃ for 1h.The films UV-vis sp ectropho-tometry X-ray diffraction (XRD),atomic force microscope (AFM) are use d to find the optical,structural,morphological analysis of as-deposited and ann ealed films respectively.Results indicate tha t the as-deposited films at (300℃) have amorpho us nature while films annealed at 400℃－600℃ show polycrystalline in nature.The optical absorbance and surface roughness are increased with increase of annealing temperature,while optical energy band gap is decrease d.Anatase phase presents better photocatalytic performance.