Ag掺杂对TiO2薄膜光学性能的影响
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(辽宁师范大学 物理与电子技术学院,辽宁 大连 116029)

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王玉新(1974-),女,博士,副教授,硕士生导师,主要从事光电信息材料与器件方面的研究.

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辽宁省教育厅科学研究项目(LJ2019006)资助项目 (辽宁师范大学 物理与电子技术学院,辽宁 大连 116029)


Effect of Ag doping on optical properties of TiO2thin films
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(College of physics and electronic technology,Liaoning Normal University,Dalian ,Liaoning 116029,China)

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    摘要:

    氧化钛(TiO2)作为一种重要的半导体材料可应用于多个领域。实验通过溶胶-凝胶旋 涂 法,分别用钛酸丁酯(Ti(OC4H9)4)提供钛源、硝酸银(AgNO3)提供银源,制备了TiO 2的本征 和Ag单掺的薄膜样品。样品的结构、表面形貌及光学性能分别采用X射线衍射仪(X-ray diffractometer,XRD)、扫描电子显微镜(scanning electron microscope,SEM)、紫外- 可见分光光 度计(ultraviolet-visible spectrophotometer,UV-Vis)进行分析、表征。结果表明: 所制备的样 品均为锐钛矿相且沿(101)晶面取向择优生长。与本征TiO2相比,Ag+的掺杂并没有改变 衍 射峰的峰位或出现杂峰,样品的晶粒尺寸相对减小、晶面间距及半高宽均有所增大;样品的 表面得到修饰,缺陷减少,变得更为致密、均匀、晶粒之间的排列更加有序;样品的吸收边 出现红移的现象,带隙能减小。当Ag+掺杂量为1.5 at%时,样品的性能相对较好,表现为 (101) 衍射峰最为尖锐,晶粒尺寸最小,薄膜间的孔隙最少,禁带宽度最小为3.476 eV。

    Abstract:

    As an important semiconductor material,titanium oxide (TiO2) can be us ed in many fields.The sol-gel spin coating method was used to provide titanium sourc e and silver nitrate (AgNO3) to provide silver source with butyl titanate (Ti(OC4H9)4) respectively.The intrinsic and Ag doped TiO2films were prepared.The structure,surface morpholo gy and optical properties of the samples were analyzed and characterized by X-ray diff raction (XRD), scanning electron microscopy (SEM) and ultraviolet visible spectrophotometer (UV -Vis).The results show that all the samples are anatase and grow preferentially along the (101) crystal plane.Compared with the intrinsic TiO2,the doping of Ag+ does not change the peak position of diffraction peak or appear impurity peak,the grain size of the samples is re latively reduced, the spacing between crystal planes and half height width are increased;the surf ace of the samples is modified,the defects are reduced,and the arrangement between grains is more orderly;the absorption edge of the sample is red shifted,and the band gap ener gy is reduced. The results show that the (101) diffraction peak is the sharpest,the grain size is the smallest, the pores between the films are the least,and the band gap is 3.476eV.

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王玉新,蔺冬雪,王磊. Ag掺杂对TiO2薄膜光学性能的影响[J].光电子激光,2021,32(11):1229~1234

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  • 收稿日期:2021-01-15
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  • 在线发布日期: 2022-02-25
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